A photomask is a solid plate with transparencies or holes that let light to pass from one side to the other in a predefined pattern. Exposure systems usually project an image on the wafer by using a photomask. The function of the photomask is to block the light in some specific areas. Maskless lithography procedures direct a precise beam of light directly onto the surface of the wafer without using a mask. However, it is seldom used for commercial processes. Exposure systems falls under the semiconductor production equipment. The capability to draw a flawless image of a small pattern onto the surface wafer is maintained by the wavelength of the light, and the capacity of the lens system to follow diffraction commands from the mask. Advanced tools use deep ultraviolet light from lasers with wavelengths between 193 and 248 nm. Sustainable growth in the global semiconductor market is acting as a key driver for the growth of the overall exposure systems market . The upsurge in sales of co...